High- and medium-entropy nitride coatings from the Cr–Hf–Mo–Ta–W–N system: Properties and high-temperature stability

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Publikace nespadá pod Filozofickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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SOUČEK Pavel DEBNÁROVÁ Stanislava ZUZJAKOVÁ Šárka LIN Shuyao FEKETE Matej CZIGÁNY Zsolt BALÁZSI Katalin VRÁNA Lukáš PITOŇÁKOVÁ Tatiana JAŠEK Ondřej ZEMAN Petr KOUTNÁ Nikola

Rok publikování 2026
Druh Recenzovaný odborný článek
Časopis / Zdroj Journal of the European Ceramic Society
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://www.sciencedirect.com/science/article/pii/S095522192600138X
Doi https://doi.org/10.1016/j.jeurceramsoc.2026.118262
Klíčová slova Magnetron sputtering; High entropy ceramics; Refractory metals; Nitrides; Temperature stability
Přiložené soubory
Popis High- and medium-entropy nitride coatings from the Cr–Hf–Mo–Ta–W–N system were studied using ab initio calculations and experiments to clarify the role of entropy and individual elements in phase stability, microstructure, and high-temperature behaviour. Formation energy calculations indicated that nitrogen vacancies stabilise the cubic (fcc) phase, with hafnium and tantalum acting as strong stabilisers, while tungsten destabilises the lattice. Coatings were deposited by reactive magnetron sputtering at ~50 °C (AT) and ~580 °C (HT). All exhibited columnar fcc structures; high-temperature deposition produced denser coatings, lower nitrogen content, and larger crystallites, resulting in higher hardness and elastic modulus. Thermal stability was tested up to 1200 °C on Si and oxidation at 1400 °C on sapphire. AT coatings failed early, while most HT coatings endured. Nitrogen loss ?10 at.% at 1000 °C was critical for survival. TEM revealed tungsten segregation and HfO2 formation, while fcc nitride remained dominant. Ta enrichment proved essential for superior thermal and oxidation stability.
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