Low temperature temporal and spatial atomic layer deposition of TiO2 films
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Year of publication | 2015 |
Type | Article in Periodical |
Magazine / Source | Journal of Vacuum Science & Technology A |
MU Faculty or unit | |
Citation | AGHAEE, Morteza; Philipp MAYDANNIK; Petri JOHANSSON; Jurkka KUUSIPALO; Mariadriana CREATORE; Tomáš HOMOLA and David Campbell CAMERON. Low temperature temporal and spatial atomic layer deposition of TiO2 films. Journal of Vacuum Science & Technology A. AVS: Science & Technology of Materials, Interfaces, and Processing, 2015, vol. 33, No 4, p. "nestránkováno", 9 pp. ISSN 0734-2101. Available from: https://dx.doi.org/10.1116/1.4922588. |
web | http://scitation.aip.org/content/avs/journal/jvsta/33/4/10.1116/1.4922588 |
Doi | http://dx.doi.org/10.1116/1.4922588 |
Field | Solid matter physics and magnetism |
Keywords | ALD |
Description | Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as coreactants. |
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