Enhanced permeability dielectric thin films with tailored properties deposited by magnetron sputtering on silicon

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Authors

FALUB Claudiu V. PIETAMBARAM Srinivas V. YILDIRIM Oguz MEDUŇA Mojmír CAHA Ondřej HIDA Rachid ZHAO Xue AMBROSINI Jan ROHRMANN Hartmut HUG Hans J.

Year of publication 2019
Type Article in Periodical
Magazine / Source AIP Advances
MU Faculty or unit

Faculty of Science

Citation
Web Full Text
Doi http://dx.doi.org/10.1063/1.5079477
Keywords Magnetic hysteresis; Metal oxides; X-ray diffraction; Magnetron sputtering; X-ray reflectivity; X-ray fluorescence
Description We have studied the structural and magnetic properties of enhanced-permeability-dielectric (EPD) FeCo/Al2O3-multilayer thin films deposited on 8”-Si wafers in an industrial magnetron sputtering system.
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