Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses

Warning

This publication doesn't include Faculty of Arts. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	ZAJÍČKOVÁ Lenka OHLÍDAL Ivan JANČA Jan
Year of publication	1996
Type	Article in Periodical
Magazine / Source	Thin Solid Films
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	PECVD; TEOS
Related projects:	Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates