Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process
| Authors | |
|---|---|
| Year of publication | 2009 |
| Type | Article in Proceedings |
| Conference | Book of Contributed Papers of 17th Symposium on Applications of Plasma Processes |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | reactive sputtering |
| Description | Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process, proceeding |
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