Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process

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Authors	DVOŘÁK Pavel VAŠINA Petr
Year of publication	2009
Type	Conference abstract
MU Faculty or unit	Faculty of Science
Citation
Description	Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process - proceeding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition