Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge
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Year of publication | 2011 |
Type | Article in Periodical |
Magazine / Source | Surface & Coatings Technology |
MU Faculty or unit | |
Citation | SCHÄFER, Jan; Stefan HORN; Rüdiger FOEST; Ronny BRANDENBURG; Petr VAŠINA and Klaus-Dieter WELTMANN. Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge. Surface & Coatings Technology. Elsevier Science, 2011, vol. 205, 25.7.2011, p. "S330"-"S334", 5 pp. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2011.03.124. |
Doi | http://dx.doi.org/10.1016/j.surfcoat.2011.03.124 |
Field | Plasma physics |
Keywords | SILVER NANOPARTICLES; PLASMA; JET |
Description | SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR. |
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