Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge

Warning

This publication doesn't include Faculty of Arts. It includes Faculty of Science. Official publication website can be found on muni.cz.

Authors	SCHÄFER Jan HORN Stefan FOEST Rüdiger BRANDENBURG Ronny VAŠINA Petr WELTMANN Klaus-Dieter
Year of publication	2011
Type	Article in Periodical
Magazine / Source	Surface & Coatings Technology
MU Faculty or unit	Faculty of Science
Citation	SCHÄFER, Jan; Stefan HORN; Rüdiger FOEST; Ronny BRANDENBURG; Petr VAŠINA and Klaus-Dieter WELTMANN. Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge. Surface & Coatings Technology. Elsevier Science, 2011, vol. 205, 25.7.2011, p. "S330"-"S334", 5 pp. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2011.03.124.
Doi	http://dx.doi.org/10.1016/j.surfcoat.2011.03.124
Field	Plasma physics
Keywords	SILVER NANOPARTICLES; PLASMA; JET
Description	SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface