Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes

• Authors: DVOŘÁK Pavel; ŽEMLIČKA Radek; VAŠINA Petr; BURŠÍKOVÁ Vilma
• Year of publication: 2011
• Type: Conference abstract
• MU Faculty or unit: Faculty of Science
• Citation: DVOŘÁK, Pavel; Radek ŽEMLIČKA; Petr VAŠINA and Vilma BURŠÍKOVÁ. Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes. In Potential and Application of Nanotreatment of amedical Surfaces. 2011.
• Description: Higher harmonic frequencies of discharge voltage or current were analyzed and used for monitoring of various deposition techniques. It was shown that higher harmonics sensitively react on creation of a thin film, which can be used for simple monitoring of plasma processes.

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