Development of plasma enhanced chemical vapor deposition reactor for preparation of oxygen containing organosilazane polymer thin films

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Publikace nespadá pod Filozofickou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.
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PŘIBYL Roman KELAROVÁ Štěpánka HOMOLA Vojtěch BURŠÍKOVÁ Vilma

Rok publikování 2020
Druh Článek ve sborníku
Konference 11th International Conference on Nanomaterials - Research & Application (NANOCON 2019)
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://doi.org/10.37904/nanocon.2019.8749
Doi http://dx.doi.org/10.37904/nanocon.2019.8749
Klíčová slova PECVD; nanoindentation; profilometry; confocal microscopy; AFM
Popis In the present work we focused on the development of a low pressure capacitively coupled radio-frequency PECVD reactor for preparation of plasma-polymer thin films from organosilazane precursors. The dependence of the film growth from hexamethyldisilazane (HMDSZ, SiN2C6H19) and oxygen containing mixtures on the deposition parameters was studied. The time evolution of the negative self bias voltage on the thin film growth was studied. It was found, that the changes in the self bias voltage significantly influenced the surface structure and the properties of the growing films. The mechanical properties of the films were studied using nanoindentation technique and the surface structure was studied using atomic force microscopy (AFM).
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